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Epiluvac is a privately owned Swedish company founded in 2013 by a team of engineers. With decades of research and development experience from the CVD reactor field and especially hot-wall CVD epitaxy equipment for Silicon Carbide. Epiluvac provides standard as well as customized reactor solutions and a wide range of service and maintenance packages. Recent customized solutions include reactor designs for graphene and nanowire manufacturing among others.

Epiluvac provides equipment to manufacture these excellent WBG semiconductor materials. Our main products are deposition systems for epitaxial growth of SiC and GaN by Chemical Vapor Deposition (CVD) and crystal growth systems for SiC. Decades of experience enable us to offer highest possible performance in terms of quality and yield, while keeping operational costs at a minimum.

Epiluvac specializes in the following

  • Chemical Vapor Deposition Solutions (CVD/MOCVD)

  • WBG semiconductors

  • Silicon Carbide (SiC)

  • Gallium Nitride (GaN)

  • Nanowire, Graphene, Thin film, High-purity gas solutions, High temperature, PVT, Sublimation, Crystal growth, Epitaxy



Epiluvac products are normally delivered as complete systems including reactor module, gas delivery system, process control, safety system, installation, and commissioning. Each system is tested extensively before shipment, and once installed the delivery also includes all necessary customer trainings for operation and maintenance.